Support - Equipment
高分辨聚焦离子束电子束双束扫描电子显微镜FIB
| number | |
| Specifications | |
| Manufacturer | 赛默飞(FEI) |
| model | Helios 5 UX |
| Manufacturing country | 美国 |
| Classification number | 1 |
| Placement location | 郭可信材料表征中心 B130 |
| date of production | 2023-08-24 |
| Acquisition Date | 2023-08-24 |
| Network access date | 1970-01-01 |
information
reservation
| Main specifications and technical indicators | 1、二次电子分辨率：≤0.6 nm @ 15kV；≤0.8 nm @ 1kV； |
| Main functions and features | Helios 5 UX可用于金属、半导体、电介质、多层膜结构等固体样品上微纳结构的表征及高质量定点APT、TEM样品制备，化学和晶体结构三维形态分析。可进行离子束刻蚀、离子束沉积、电子束沉积；高分辨扫描电镜功能可对离子束加工试样进行实时观测。 |
Main attachments and configurations |
同轴TKD和平插能谱 |
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